2004 Semitool Sirius System
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Description
- Model: Sirius HydrOzone
- Wafer Size: 150mm & 200mm wafer capable
- Process: DI water/ozone
- Rinse: DI water with ammonium hydroxide
- Dry: N2
- Spray processing chamber.
- Uses a minimal amount of deionized water and ozone
- Low cost, low environmental impact process used for photoresist stripping, photolithography rework and organic cleans
- Does not require the use of sulfuric acid with its related delivery and disposal costs
- Year of Manufacture: 2004
Specifications
Manufacturer | Semitool |
Model | Sirius System |
Year | 2004 |
Condition | Used |
Stock Number | GOD23082019720222068 |