2006 DNS SS300
2006 DNS SS300
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Description
300mm
Tool is operating in clean room.
[Chamber A]
Process : Wafer surface clean
Chuck : Vacuum Chuck
SPRAY : Soft Spray N2 10~100NL/min
Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ
Spin DRY : 3000rpm Spin Dry only
[Chamber B]
Process : Wafer surface clean
Chuck : Vacuum Chuck
SPRAY : Soft Spray N2 10~100NL/min
Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ
Spin DRY : 3000rpm Spin Dry only
[Chamber C]
Process : Wafer Backside clean
Chuck : Mechanical Chuck
SPRAY : None
Burush : PVA Burush
Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ
Spin DRY : 2400rpm Spin Dry only
[Chamber D]
Process : Wafer Backside clean
Chuck : Mechanical Chuck
SPRAY : None
Burush : PVA Burush
Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ
Spin DRY : 2400rpm Spin Dry only
Missing or damaged parts: Not reported.
Specifications
| Manufacturer | DNS |
| Model | SS300 |
| Year | 2006 |
| Condition | Used |
| Stock Number | BM2744 |