2006 DNS SS300

2006 DNS SS300

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Description

300mm

Tool is operating in clean room.

[Chamber A]

Process : Wafer surface clean

Chuck : Vacuum Chuck

SPRAY : Soft Spray N2 10~100NL/min

Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

Spin DRY : 3000rpm Spin Dry only

[Chamber B]

Process : Wafer surface clean

Chuck : Vacuum Chuck

SPRAY : Soft Spray N2 10~100NL/min

Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

Spin DRY : 3000rpm Spin Dry only

[Chamber C]

Process : Wafer Backside clean

Chuck : Mechanical Chuck

SPRAY : None

Burush : PVA Burush

Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

Spin DRY : 2400rpm Spin Dry only

[Chamber D]

Process : Wafer Backside clean

Chuck : Mechanical Chuck

SPRAY : None

Burush : PVA Burush

Rinse :DIW/ CO2 INJENCTION ,resistivity <1MΩ

Spin DRY : 2400rpm Spin Dry only

Missing or damaged parts: Not reported.

Specifications

ManufacturerDNS
ModelSS300
Year2006
ConditionUsed
Stock NumberBM2744