2005 AMAT P5000

2 Chambers (1CVD 1ETCH)

6 Inches

Condition : Working

   * The equipment is currently in use at the fab.

Process : 2 chambers

 * CVD 1 Chamber (TEOS SiO2 Depo.)

 * Etch 1chamber (Oxide Etch)

Gas Supply : CHF3, CF4, C2F6, TEOS, Ar, He, O2, N2, Air