TEL ACT Clean Track 12 Single Block Tool

Single Block LH type.

Recently powered off and just crated and in warehouse

➢ Manufacturer: Tokyo Electron

➢ Tool Type: Single Block Clean Track

➢ Model: ACT 12

➢ Wafer Size: 300mm

➢ Direction: LEFT HAND SIDE

➢ Utilized with Nikon S204/205 Scanner Exposure Tool

➢ General

iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility

3 Blocks Interfaced: Foup-Process Block-Scanner Interface

3 Wafer Transfer Robot Arms: Foup-Process Block-Scanner Interface

Control Module on Cassette End-Station (CES) or Foup

➢ Interface Block

Single-pincette shared wafer transfer with centering guides

Standard wafer arm and interface panel to accommodate stepper/scanner

Interface includes a CPL for insuring consistent wafer temps into the

stepper/scanner

➢ 2 Coaters (COT)

4 resist nozzles with temperature control

16 layer resist and solvent filters

T-100 resist pumps

4L or 1L Nowpak capability

➢ 2 Developers (DEV)

2 “H” nozzles with temperature control per cup

16 layer developer filter

Bulk-FSI system for developer

➢ 2 Adhesion Process Stations (ADH)

Half sealed chamber with dispersion plate for HMDS

➢ 5 Chill Plate Process Stations with temperature control (CPL)

➢ 1 Transfer Chill Plate (TCP)

➢ 8 Low Temperature Hot Plate Process Stations with temperature control (LHP)

➢ 4 Precision Chilling Hot Plate Process Stations for SB or PEB (PHP)

➢ 1 Wafer Edge Exposure Process Station (WEE)

DUV illumination monitor on lamp housing

Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern

➢ Subcomponents

Fluid Temperature Controller

Temperature & Humidity Controller

Chemical Cabinet