Oxford Plasmalab 80 Plus PECVD tools
Oxford Plasmalab 80 Plus PECVD tools
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Description
2x available
PECVD 80+ SiO2 Dep
- Non-functional tool but can be repaired (requires Silane MFC)
- Designed for 4” wafers but can do 6”
- Deposits SiO2 & SiH4 @ 300C
- All MFCs for above processes are operational bar the Silane one
- Is an OIPT tool but has bespoke software. Built 1995, software upgrade 2010
- No burner gas abatement
- Control PC
- Edwards E2M80 vacuum pump
- Rf Generator
- PECVD 80+ SiNx Dep
- Functional tool
- Designed for 4” wafers but can do 6”
- Deposits SiO2, SiH4 & Amorphous Si @ 300c
- Has working MFCs to achieve above deposition
- Is an OIPT tool built 1998
- Burner gas abatement
- Control PC
- Edwards E2M80 vacuum pump
- Rf Generator
Specifications
| Manufacturer | Oxford |
| Model | Plasmalab 80 Plus PECVD tools |
| Condition | Used |
| Stock Number | BM3183 |