2004 Oxford PlasmaLab System 133+ RIE CL Reactive Ion Etcher

Was refurbished with OEM specifications

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)

Mechanical chuck

RIE set up for GaN Etch

RF Power: 600W, 13.56MHz

Water cooled electrode 10C-80C

End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 8 lines including following 7 MFCs:

• Ar – 100sccm
• CL2 – 100sccm
• BCL3 – 100sccm
• N2O – 200sccm
• CHF3 – 200sccm
• NH3 -100sccm
• CH4 – 50sccm

Windows PC, user friendly interface GUI

This tool was removed from production October 2014.