2006 Oxford PlasmaLab System 100 RIE (FL) Reactive Ion Etcher

Condition : Refurbished with OEM specifications

Configuration: 

• Supports wafer sizes up to 300mm (330mm Platen)
• RIE set up for SiO2 Etch
• RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz,
• Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller
• Blue color PLC type
• Water cooled electrode 10C-80C
• Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm
• Windows PC , user friendly interface
• Lauda WK 1200 Chiller was utilized by previous user. Not included.

This tool was removed from production October 2014.