GaSonics PEP 4800DL Iridia

GaSonics PEP 4800DL Iridia

Gasonics dual chamber etcher used to independently

deskin (remove a crusted layer of photoresist without

penetrating a lower layer of conventional photoresist) or

to independently remove photoresist. Tool can also be

used in a two step process: deskin a wafer and in a

second step perform a conventional as removal. The tool

operates while simultaneously producing microwave

energy and rf energy.