PlasmaQuest MOCVD reactor system with Thermal Scrubber and Neslab Chiller & Shimadsu DLI System

The PlasmaQuest's MOCVD reactor system is a dual-chamber (thermal and plasma) MOCVD reactor with various equipment and peripherals including turbo pump, vane pump, thermal scrubber, chiller, specialty lines for gases/chemical precursors, and DLI system (DLI description in the   attached file ).  The reactors are capable of handling up to 200 mm (or 8-inch) wafers on a rotatable chuck for deposition and reactive ion etching.  Additionally, many view-ports are available for connecting a repertoire of advanced surface analytical equipment for real-time process monitoring.  Moreover, the chambers are connected through a load lock and the whole system is interfaced to a PC on an electronics rack.  The system can be fully automated for R&D and pilot line.