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Ulvac Entron W-200T6 PVD Sputtering Tool

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Description

2006 tool. Ulvac PVD/CVD. Can be reconfigured to 6 PVD chambers. Entron W-200T6 System (1E3T2H) – Full Acceptance 1 x Chemical Dry Pre-Clean Chamber 1 x Anneal Chamber for Chemical Dry Pre-Clean Chamber 1 x Anneal Chamber for Post Anneal 1 x PVD-Ni (Ring-Ni) Chamber 1 x PVD-TiN (Normal) and 1 x PVD Co (Normal) Chambers Quotation also includes: Open Cassette Buffer Station 2 Sets of Spare Shields per Chamber Host Communications (SECS/GEM); S2 Safety Customer Supplied Items: Normal TiN Target Normal Co Target Normal Ni Target and backing plate (should customer want to run Normal Ni) Dry Pumps Gas Scrubber

Specifications

ConditionUsed