2011 NIKON NSR-S208D

Lithography Step and repeat scanning system

Tool Status Running Wafers

Wafer Size 300 mm

Fab Section Lithography

Asset Description Lithography Step and repeat scanning system

Software Version 1.80 MCSW+OCSW

CIM SECS

Process Exposure Wafers ( 248nm ) KRF

Main System NA

Factory Interface FOUP 1 

right site operation unit 1