2005 NIKON NSR-S208D

Tool Status Running Wafers

Wafer Size 300 mm

Fab Section Lithography 

Asset Description Lithography Step and repeat scanning system

Software Version 1.80 MCSW+OCS

CIM SECS

Process Exposure Wafers ( 248nm ) KrF

Handler System Wafer Handler System 1

Handler System Reticle Handler System 1

Options System Others Chiller 1

Others Chamber_Filter_Cabinett LFU 1

Others A/C Bower Box 1

left site operation unit 1