2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide

Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace

Currently Configured for 300mm wafer size

MFG Date: 2013

EQUIPMENT DETAILS:

Inspect to confirm configuration and condition.

Configuration :

Software Version : Ver.6.07

System Controller is Model 780

The last PM date is 2016/09/24

Off-line date is 2017/11/06

Can produce wafers as is

All cables are present

Platform Type is TELINDY PLUS I-RAD

Process Type is Gate Oxide / SiO2

Temperature Range is Mid Temp 500-800 C

Wafer Handling :

Wafer Type is 300 mm

Carrier Type is 25 slot

Carrier Stage Capacity is special

WTU Type is 1+4 Edge Grip

Production Wafers qty are 100

Boat Operation is 1 Boat Type

Gas Panel Configuration :

MFD Make is ADVANCED ENERGY

Gas MFC-Model MFC-Size

N2 MFC-NX 50 SLM

O2 MFC-O1 20 SLM

HF MFC-XF1 5 SLM

N2 MFC-N1 10 SLM

Gas MFC-Model MFC-Size

N2 MFC-N2 10 SLM

N2 MFC-N3 5 SLM

N2 MFC-N4 10 SLM

N2 MFC-NL 1000 SLM

N2 MFC-NBS 400 SLM

N2 MFC-NR 500 SCCM

Reactor Configuration :

Quartz Material is Electric Fused

Quartz Provide is TEL

Process TUBE is I Red TUBE

TUBE Sealing is special O-ring

Boat Type is 117 slot

Boat Material is Quartz

Pedestal Type is Quartz

Auto shutter is shutter purge type

Edwards-IXH3030T Vacuum pump is included