Tokyo Electron Ltd. Trias Ti/TiN Chamber

Tokyo Electron Ltd. Trias Ti/TiN Chamber
Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals Currently Configured for 300mm wafer ...

2005 Kaijo Corporation SFT-305e

2005 Kaijo Corporation SFT-305e
Kaijo Corporation SFT-305e Batch Wafer Processing Currently Configured for 300mm wafer size MF...

Kaijo Corporation SFT-300

Kaijo Corporation 	SFT-300
SFT-300 Kaijo Corporation Batch Wafer Processing Etch/Clean - Wet Processing

S.E.S. CO., LTD. BW3000X

S.E.S. CO., LTD. 	BW3000X
BW3000X S.E.S. CO., LTD. Batch Wafer Processing Etch/Clean - Wet Processing

2004 Ebara FREX300S

2004 Ebara 	FREX300S
Ebara FREX300S Dielectric CMP Currently Configured for 300mm Wafer Size MFG Date: 2004 EQUIPME...

2010 Applied Materials Centura ACP DPN Gate Stack

2010 Applied Materials Centura ACP DPN Gate Stack
Applied Materials Centura ACP DPN Gate Stack Decoupled Plasma Nitride Currently Configured for ...

2014 Novellus Systems Inc. Concept Three Altus Max EFX

2014 Novellus Systems Inc. 	Concept Three Altus Max EFX
Novellus Systems Inc. Concept Three Altus Max EFX WCVD (Chemical Vapor Deposition) Currently Con...

2012 ASM International Eagle XP EmerALD

2012 ASM International 	Eagle XP EmerALD
ASM International Eagle XP EmerALD ALD (Atomic Layer Deposition) Currently Configured for 300mm...

Applied Materials Endura II Chamber: TxZ CVD TiN

Applied Materials Endura II Chamber: TxZ CVD TiN
Applied Materials Endura II Chamber: TxZ CVD TiN PVD (Physical Vapor Deposition) Currently Confi...

Applied Materials Producer GT3 APFe

Applied Materials 	Producer GT3 APFe
Applied Materials Producer GT3 APFe PECVD (Chemical Vapor Deposition) Currently Configured for 3...

2007 Tokyo Electron Ltd. Trias Ti/TiN

2007 Tokyo Electron Ltd. 	Trias Ti/TiN
Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) Currently Configured for ...

2015 Applied Materials Producer GT SiCoNi Clean

2015 Applied Materials 	Producer GT SiCoNi Clean
Applied Materials Producer GT SiCoNi Clean PECVD (Chemical Vapor Deposition) Currently Configure...