Semiconductor Fabrication - Furnaces/diffusion systems for sale at ...

Used S.E.S. CO., LTD. BW3000X

BW3000X S.E.S. CO., LTD. Batch Wafer Processing Etch/Clean - Wet Processing

Used 2004 Ebara FREX300S

Ebara FREX300S Dielectric CMP Currently Configured for 300mm Wafer Size MFG Date: 2004 EQUIPME...

Used 2010 Applied Materials Centura ACP DPN Gate Stack

Applied Materials Centura ACP DPN Gate Stack Decoupled Plasma Nitride Currently Configured for ...

Used 2012 ASM International Eagle XP EmerALD

ASM International Eagle XP EmerALD ALD (Atomic Layer Deposition) Currently Configured for 300mm...

Used 2007 Tokyo Electron Ltd. Trias Ti/TiN

Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition) Currently Configured for ...

Used 2015 Applied Materials Producer GT SiCoNi Clean

Applied Materials Producer GT SiCoNi Clean PECVD (Chemical Vapor Deposition) Currently Configure...

Used 2006 Applied Materials Endura II Liner/Barrier

Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) Currently Configured f...

Used 2010 Novellus Systems Inc. VECTOR Express

Novellus Systems Inc. VECTOR Express PECVD (Chemical Vapor Deposition) Currently Configured for...

Used 2005 Applied Materials Centura AP Ultima X

Applied Materials Centura AP Ultima X HDP CVD (Chemical Vapor Deposition) Currently Configured f...

Used 2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide

Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace Currently Configured for 300m...

Used Tokyo Electron Ltd. Trias Ti/TiN Chamber

Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals Currently Configured for 300mm wafer ...

Used Aviza Technology, Inc. RVP-300

Aviza Technology, Inc. RVP-300 Vertical Diffusion Furnace Currently Configured for 300mm wafer ...