VCR Group IBS TM200S Ion Beam Sputterer

VCR Group IBS TM200S Ion Beam Sputterer

VCR Group IBS TM200S ion beam sputtering system is useful for SEM

and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating

device is equipped with a 200 l/s turbo-molecular pump, an ion-beam

gun, a quartz crystal thickness monitor, a four-position target carrier, and

a liquid nitrogen cold trap.

System specifications:

Electrical:

 Interlocked to prevent high voltage shock

110 V AC, 50/ 60 Hz, 15 A

220 V AC, 50/ 60 Hz, 10 A (Optional)

Mechanical:

Weight: < 500 lbs

Size: Approximate overall dimensions

50” H x 24” W x 32” D (chamber lid open)

40” H x 24” W x 32” D (chamber lid closed)

Utilities:

Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure

Nitrogen Gas Flow: Turbomolecular Pump bleed

Water Flow: 30 GPH, clean water