2011 Jeol JBX 6000 FS/E

Wafer Sizes:

8"/200mm

Vintage:

2011

. E-Beam Source : ZrO/W TFE

. Acc Voltage : 50/25KV

. Beam Shape : Spot Beam

. Scanning Type : Vector Scanning

. Stage Movement : Vector Scanning

. Maximum Wafer Size : 200mm

. Minimum Beam Diameter : 5nm

. Laser Control Resolution : λ /1024 (0.62nm)

. Beam Deflection : 1 Stage Electro-static

Exclusions from Sale: Two dry pumps (in use, separated, and stored)