2017 RENA Technologies GmbH RENA BatchW

Batch Wafer Processing

Etch/Clean - Wet Processing

Date of Manufacture: 2017-01-01

Currently Configured for: 200mm

Rena Wet Etch

Running in production

4x etch tanks with 4x spray rinse tanks

2x solvent tanks with 1x rinse tank

2x SRD

Staubli robot for automation