1997 Tokyo Electron Ltd. (TEL) ALPHA-8S ATM OXIDE

TEL Alpha-8S Oxide ATM Furnace System

Install Type: Through-the-wall

System Status: On-Line (operational at time of inspection)

Audit Report Available: No

Decontamination Report: Not available

Wafer Production (AS IS): Yes - system can produce wafers in current condition

Known Field Modifications: None

All Cables Present: Yes

System Configuration

• OEM / Model: TEL Alpha-8S-E Oxide ATM
• Process Name: Oxide
• Front Surface Finish: White
• Process Pressure: Atmospheric
• Number of Zones: 5
• Temperature Controller: Model 121
• Inner TC Type: In-line
• Rapid Cooling Unit: No
• Boat Rotation: Yes
• Signal Lamp Tower: Yes
• Gas Leak Detection: Yes

Wafer Handling

• Wafer Size: 8 inch (200 mm)
• Wafer Type: Notch
• Number of Slots: 26
• Bolt-On SMIF: No
• Integrated SMIF: No
• Stocker: 21-slot carrier
• N₂ Purge System: Yes

Control & Software

• System Controller: TS-4000Z
• Software Version: V07.06
• Date of Last PM: 2020 (last use)
• Temperature Range: 960 °C (max. 1025 °C)
• FTP Heater: No

Transfer & Sensing

• Tube Seal: Lip Seal
• Transfer Stage: Equipped
• Wafer Position Sensor: Yes
• Fork Wafer Present Sensor: Yes
• Notch Alignment: No (function not in use)
• Fork Wafer Position Sensor: Yes