TRION PHANTOM II RIE ICP REACTIVE ION ETCHER w INDUCTIVELY COUPLED PLASMA SOURCE

TRION PHANTOM II RIE ICP REACTIVE ION ETCHER w INDUCTIVELY COUPLED PLASMA SOURCE

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Description

TRION TECHNOLOGY PHANTOM II RIE ICP REACTIVE ION ETCHER w INDUCTIVELY COUPLED PLASMA SOURCE

Unit Specifications

Make: Trion Technology

Model: Phantom II

Type: Reactive Ion Etcher (RIE)


Configured and comes with:

  • Advanced Energy 3155082-220 RF Generator (Qty:2)
  • Applied Energy EPS200 Power Supply
  • MKS 153F-3-80-2 Type 153 Control Valve
  • MKS LPV-25-AK-C0VS Valves (Qty:2) 
  • Pfeiffer TPH 521 P C PMP02861H Turbo Pump
  • Pfeiffer TPS 300 PM041814-T Power Supply
  • VAT 02110-BH24-0001 Gate Valve
  • All/ only parts/ components/ cables as shown

Description

This system is used, untested, as shown. As we do not have the technical expertise to further test the unit, we are selling it on an "AS IS BASIS". Inspection is available, or if you'd like us to perform further tests/checks, please write to us with your set of instructions.


Specifications

ManufacturerTRION
ModelPHANTOM II RIE ICP REACTIVE ION ETCHER w INDUCTIVELY COUPLED PLASMA SOURCE
ConditionUsed
Stock NumberBM5387