AMAT Epi Centura 300 -RP

Epitaxial Silicon (EPI)

Deposition Equipment

300mm

Asset HDD not included

• Vendor : AMAT

• Model: Centura Epi 300 (2-chamber)

• Wafer Size: 300mm

• Factory Interface (FI) with 2 N2 loadports accommodating FOUP or Open Cassette Loadports (OCLP)

• FI version 5.3

• Transfer Chamber

o Magnetically coupled, single-blade robot handler using On-the-Fly (OTF) wafer centering and Wafer-on-Blade (WOB) wafer detection

o Pneumatic manifolds

• 2 automatic Batch loadlocks using integrated point-of-use pump (iPUP)

• 2 Process Chambers

o Upper and lower quartz domes

o Upper and lower lamp modules

o Susceptor

o Jet Pack blower cooling system

o Exhaust system

o Low Temp Pyrometer

• Temperature control using optical pyrometers and closed loop PID control system

• Remote frame support structure

o Reduced Pressure NextGen Gas panel has mass flow controllers (MFCs) and control valves

o Leak detectors and safety interlocks

• Reduced pressure systems use a second iPUP for the transfer chamber and a remote high capacity pump for each process chamber

• Mainframe computer—c300NT (runs MS Windows NT)

• Front End PC (FE PC) UI commands and configures c300NT