KLA-Tencor Corp. Archer 500 AIM SCOL

5 available

300mm

Overlay Measurement System

Metrology Equipment

Archer 500 AIM main components-

integrated console

inspection station

equipment frond end module (EFEM)

Optics system

HLS (halogen light source)

AMS (aligment microscope)- is used for wafer alignment (global alignment & reference point recognition). The AMS contains its own light source and microscope. It is attached to the Optical Column and moves vertically (during Focusing) by the Z stage.

Optical column- the linnik is used for metrology measurements for > 10nm design nodes

Improved total measurement uncertainty (TMU) and move-acquire-measure (MAM) time compared to previous generations of Archer tools

Multilayer AIM measurement and XY separation capability allow for better precision on challenging layers

Advanced Tool Induced Shift (TIS) management software available for improvements in throughput and reduction in TMU

Scatterometry Overlay (SCOL) Technology (if applicable*)

Standard optical imaging technology reaches very high capabilities in terms of performance and total easurement uncertainty; however, SCOL-based technology complements classic metrology and mitigates potential risks that might arise in advanced processes. The combination of optical imaging and SCOL is a unique configuration with excellent accuracy and matching to AIM targets

*Check model number on the machine to determine availability

A500SCOL- SCOL is included on this model