2006 Canon FPA-5500iZa

Further spec attached below

Reticle

Size □6′′ t=0.25′′

Surface 2 Layers Cr、3 Layers Cr, HT

Pellicle Only pattern surfaces can be installed

Wafer Size 300mm

Wafer chuck type 12 Inch Pin chuck

Exposure System

Projection Lens UL61-II

Magnification 1 : 4

NA Auto Variable (0.57~0.45 / 0.01 Resolution)

Screen Size 26 x 33mm

Exposure Light i Line (365nm)

Optical Component protection CDA Substitution

Illumination optical system

Light source IZ Light system III

Manufacturer/Model 4.5Kw Ultra high-pressure mercury lamp

Light Mode Ushio Inc. / SUV-4500CIL

Exposure Control Choose from normal lighting

Masking Blade Cumulative exposure method

Optical Component protection Aperture Range: □0.4mm ~ X:26mm, Y:33mm

Lamp position adjustment CDA & N2 Substitution

3-axis automatic adjustment(X-axis / Y-axis / Z- axis)