TEL CLEAN TRACK LUTHIUS COAT ONLY

5 available

300mm

Coat only Track

Resist Processing Equipment

 General:

·      Block 1: Carrier w/ Wafer Transfer Arm

·      Block 2: Process w/ Wafer Transfer Arm

·      Block 3: Stepper Interface Main (Dummy)

·      AC Power Box

o   With Noise filter: CE Mark Type

o   208volt, 3-phase, star, 50/60Hz compatible

·      Carrier Block (CSB)

·    (4) FOUP Loadports

·      Carrier RFID capability

·      CSB Pressure Sensor

·      Process Block

·      Coater (COT) Qty=4

o (8) 1.2mm BARC nozzles with Temp control per Coater

o   Dual Bottle Supply for R1-R8, 4 COT supply for R7,R8

o (1) RRC nozzles with separate Pump Chemical Supply System

o   E-Bath (Nozzle Bath for each COT cup)

o   6ml Tube phram pumps

o   4L or 1L Nowpak bottle insert

o   EBR angle adjustment capability

o   Bulk-FSI system for solvent dispense

o   Exhaust Pressure Control (EPC) per coater module inside track

o   Exhaust duct and drain case cleaning function

o   Multi-Rapid Thermo Controller System

o   PP Molded Cups

·      Adhesion Processing Station (ADH) Qty=4

o   Wafer Wedging function using Plate Temperature sensor SW

·      Chill Plate Process Station (CPL) Qty=7

o   Wafer wedging function using optical detection sensor

·      Transfer Chill Plate (WCPL) Qty=1

·      Precision Chilling Hot Plate Station (CPHG) Qty=6

o   Wafer Wedging function using Plate Temperature sensor SW

·      Interface Block (Dummy) Qty=1

·      TEL Temp and Humidity Controller Qty=1

o (1) Shinwa unit for system COT,Dev T/H control

·      Chemical Cabinets Qty=1

o (1) HMDS Canister

o (2) solvent auto supply with 2-Pump Solvent chemical supply system

o (1) Sub operation panel

o   Top side facility connection

· (1) AC Power Box