TEL a8SE

Crated

Name Tokyo Electron Limited

​2-Equipement TypeDescription Alpha-8SE-ZVANS

3-Process Process typeLP-TEOS

4-Wafer TypeWafer specification200mm (8 in) Notch

5-

6-Order ConfigurationSafety specificationTEL standard

System layout typeUtility box type

N2 Purge SystemNo

Machine colorwhite

Process pressureATM

7-Furnace ConfigurationTemperature600 - 1000deg.C 

FTP heaterYES

Heater typeV0S-40-017

8-Gas configurationN210slm

O2200sccm

N2

20slm

N2100sccm

N25slm

TEOS500sccm

Piping materialSUS

9-Wafer transport configurationWafer size200mm SEMI / notch

Notch / Orientation flat AlignerNo

Number of slots（Cassette）26 slots

SMIFYes

I/O portYes

Cassette transferYes

Transfer stageYes

Wafer transferYes

Boat elevatorYes

Auto shutterYes

Fork type / material1 + 4 / Al2O3

Wafer detecting on forkYes

Wafer misalignment detecting on forkYes

10-System controller

System controllerWAVES

Gas flow chartYes (Rear)

Signal towerYes (R/Y/G) with buzzer

Signal tower positionFlont side

Unit of pressureSI (Pa)

11-Facility configurationVacuum PumpEBARA Dry Pump

Heater exaust ductUpper side

Cooling water supplyLower side