2011 KLA- Tencor SP2

Surfscan SP2 Wafer Surface Inspection System

Provide the following benefits:

*Optimized sensitivity and throughput - < 37nm defect sensitivity on polished bare silicon

*Enables qualification of current and next-generation substrates, SOI, strained SOI and strained Si

*Qualification and monitoring of process tools, at the 90, 65 and 45 nm technology nodes

*Assists in process troubleshooting and development

Includes the following components:

*UV laser

*Defect map and histogram with zoom

*iMicroView measurement capability

*SURFimage

*Real-Time Defect Classification (RTDC)

*Microsoft Windows XP Operating System

Features the following inspection modes:

* Standard Throughput Inspection Mode

* High Sensitivity Inspection Mode

Advanced Illumination Optics supporting the following mode(s):

* Oblique Illumination

Equipped with Powder Coat Painted Panels

Includes 300mm Phoenix Dual FIMS Vacuum Wafer Handler (PP)

*Ballroom Configuration (Standard)

Configured for ELB (ASIA) Power Inlet

Includes the following enable licenses:

*Optical Filter

*Enhanced XY Coordinates

*2mm Edge Exclusion

*Standard Classification Package

*LPD-N Classification

*LPD-ES Classification

*Grading and Sorting

*Haze

*Haze Analysis and Normalization

*Haze Line Classification

*IDM

High Sensitivity Inspect Mode

Std Throughput Inspect mode

*20 Degree

*40 Degree

*Rough Films

NGS Desktop Software Package

-Host ID will be required during software installation

4 Color Light Tower (RYGB)

Ion Shower for Phoenix Dual

12" PSL 0.04?m (40nm)

12" PSL 0.06?m (60nm)

12" PSL 0.083?m (83nm)

12" PSL 0.102?m (102nm)

12" PSL 0.155?m (155nm)

300mm XY Calibration Wafer

Dryer for COE

Vintage: 2011