2000 NIKON NSR - S203B

As-is condition

Tool Status Connected

Wafer Size 200 mm

Fab Section Lithography

Asset Description Photolithography Scanner 248nm

Software Version MCSV

CIM SECS

Process Photolithography

Main System NSR S203B 1

Handler System WL Type 3 1

Factory Interface Open Cassette 1

U82V (warm idled 1Q 2025)

IU Flare = 0.84%

Lens Flare = 8.50%

Uniformity = 6.00%

Power = 541 mW/cm2

Total Focus Deviation = 0.202 µm

Astigmatism = 0.119 µm

Coma = 0.040 µm

Iso DOF = .275 µm