Applied Materials AMAT P-5000 Mark II MxP+ Dielectric

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Currently Configured for: 200mm

Software: 4.8_26

MF: P5000 Mark II

Qty 4 - MxP+ Dielectric

Ch C/D ESC - Ceramic

Ch A/B ESC - Polymide

Gases Used: CO, N2, CF4, AR, O2, CHF3, C4F8

MFCs: 26 DIgital MFC's Unit and Horiba

Robot: ROBOT ASSY 8 IN AMAT 5000

Dry Pumps:

1-BA100, 3 DS80/250, 1-IQDP80/WSU151,

1-LYBOLD100/WSU151

Chillers:

2 Neslab 150, 1- Hx AMAT 0