1991 Applied Materials AMAT P-5000 Mark II DLH PECVD Silane

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Currently Configured for: 200mm

Software: b6.02

MF: P5000 Mark II

Qty 3 - DLH PECVD Silane: Silane Oxide Deposition

Chuck: Anodized Aluminum

MFCs: 24 Horiba Z500 Digital MFCs

Robot: ROBOT ASSY 8 IN AMAT 5000

Dry Pumps:

2 Edwards IQDP80/QMB250 stacks, 1IQDP80/Leybold WSU 251 stack, 1 IQDP80

Chillers:

AMAT Heatex 1

Edwards Atlas Abatement

Upgrades:

Brooks Digital Baratron Qty 1, V440 SBC