1993 Applied Materials AMAT P-5000 Mark II DLH PECVD TEOS

PECVD (Chemical Vapor Deposition)

Deposition Equipment

Currently Configured for: 200mm

Software: b6.02

MF: P5000 Mark II

Qty 3 - DLH PECVD TEOS: TEOS Deposition

Chuck: Anodized Aluminum

MFCs: 18 Horiba Z500 Digital MFCs

Praxair TEOS cabinet

Robot: ROBOT ASSY 8 IN AMAT 5000

Dry Pumps:

3 Edwards IQDP80/Leybold WSU251 stacks, 1 IQDP80

Chillers:

AMAT Heatex 1

Edwards Atlas Abatement

Upgrades:

V440 SBC