2023 Kokusai DJ-853V-8BL3

Brand-New and absolute unused Kokusai large batch deposition equipment

Useable for 

• Thin film deposition
• CVD/oxide film deposition
• Platform V3J3N
• Wafer size 200mm
• Original planned (not used) process name: HQ-SiO
• Product Wafer Load Size:100
• Process Temperature Range: 600-750 C
• Main Body ~ Utility Box (L): 2000 mm

Other Information Equipment is professional packaged, crated in OEM shell and stored.

Year of Manufacture 2023

Condition New-Never Used