2008 LAM 2300 Kiyo

Semiconductor ETC Chamber with RF Cart

Incl. Gasbox and Rocker Valve

In production until January 2023

Wafer Size Range   Minimum 200 mm  Maximum 200 mm  Set Size 200 mm

Number of Chambers 1

Process Capabilities Plasma Etch

Chamber 1 Description dual zone ESC

Controller Type VME

Temperature Control Single Pyrometer

External Cooling Water Cooled

Accessories  Rocker Valve for Installation on V2 Mainframe

16 Slot Gasbox

Power Requirements 100-240 V   41.0 A   50/60 Hz

Cooling Water Required     Minimum Temperature: 10  ºC  (50 ºF, 283.00 ºK)    Maximum 

Temperature: 50  ºC  (122 ºF, 323 ºK)

CE Marked YES

Year of Manufacture 2008

Condition Good