2008 FEI Helios Nanolab 400

Process Type: FA SEMs/TEMs/Dual Beams

Date of Manufacture: 2008 

1. Operating system: Win XP 2002, SP3

2. User interface: FEI xT 3.8.10, 10-1-2013

3. SEM SFEG

4. FIB Sidewinder (21nA)

5. UHR stage, step precise to nm level

6. 4 inch holder for loading 9 chip

7. Tilt to 52 deg in sec

8. Shuttle holder can modify to use GRID (Omniprobe function)

9. Multi GIS can select difference chemical to meet advance usage: Pt, SCM, IEE and Omni GIS Carbon deposit (injectors only if hazardous materials cannot be shipped)

10. Detectors ETD, CDM, TLD

11. Additional items: Autoprobe 200, XEI Evactron, Thermo chiller, Keithley 6485 Picoameter

12. Main OEM PC, Support PC (contains Omni GIS software as well as Autoprobe SW)