2022 KDF 974 i Sputtering System

2022 KDF 974 i Sputtering System

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Description

- Si Doped Reactive

- 974i KDF (includes Four std. 24.4" planar cathodes)

- Water Pump CTI MDL 550

- Upgrade 10" Process Cryo To Osaka Mag-Lev - Tgkine 3304MBWB-B Turbo

- Delete Four 24.4" Planar Cathodes

- Add Three 24.4" LMM Linear Moving Magnetron Cathodes for Si Doped Reactive

- Add One 24.4" MU Inset Cathode Four Piece Cathode for Chrome

- Upgrade to Tri-Sputter with Three 10Kw Pinnacle Plus Pulse DC Capability

- Upgrade to three Reactive Gas Rings and 7 Mass Flow Meter Balance Control 6 for Tr-Sput

- Delete Moving Shutter Install Fixed Shutters

- RF Option AE Dressler 3.0Kw RF Etch

- One Spare Shield set

- Three Spare LMM DSS Dark Space Shields

- One Spare MU Dark Space Shield

- Front & Rear Haynes 242 Alloy Chain Shields two sets

- H20 Cooled Anode Plate

- H20 Cooled Chamber Plates

- Four Cool Plates For Dark Space Shields LMM & MU

- IR Substrate Temp Monitor Variable Emissivity in Recipie

- Option: Upgrade lon Gauges on Cryo & Turbo - Using MKS 909AR read only

- Light Tower

- Two Edwards iLX Dry Rough Pumps

- Cathode Removal Tool

- CE Certified & SEMI S2-0200 & NFPA 79

- Two Flat SS Pallets

2022 Vintage

Specifications

ManufacturerKDF
Model974 i Sputtering System
Year2022
ConditionUsed
Stock NumberBM6449