2000 LAM/ Novellus Concept Two Dual Altus W-CVD (Chemical Vapor Deposition)

2000 LAM/ Novellus Concept Two Dual Altus W-CVD (Chemical Vapor Deposition)
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Description
- SCON
- Software: 2.45 B 39
- CIM: SECs
- Process: Tungsten CVD Process
- Handler System: Mag 7
CVD Hardware:
- 3 Cool Station
- Chamber Type: A (C2-Altus), B (C2-Altus)
- Transfer Module Robot Armset Missing
- Transfer Module Pump Missing
- Process Chamber Pump Missing
- Loadlock Pump Missing
- Abatement System Missing
Excluded:
- MKS 20705 CN
- MOER 15-050184-00 (5)
- MAT 507 BW
- RPS AX 7670-89
2000 Vintage
Specifications
| Manufacturer | LAM/ Novellus |
| Model | Concept Two Dual Altus W-CVD (Chemical Vapor Deposition) |
| Year | 2000 |
| Condition | Used |
| Stock Number | BM6450 |





