2000 LAM/ Novellus Concept Two Dual Altus W-CVD (Chemical Vapor Deposition)

2000 LAM/ Novellus Concept Two Dual Altus W-CVD (Chemical Vapor Deposition)

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Description

- SCON

- Software: 2.45 B 39

- CIM: SECs

- Process: Tungsten CVD Process

- Handler System: Mag 7

CVD Hardware:

- 3 Cool Station

- Chamber Type: A (C2-Altus), B (C2-Altus)

- Transfer Module Robot Armset Missing

- Transfer Module Pump Missing

- Process Chamber Pump Missing

- Loadlock Pump Missing

- Abatement System Missing

Excluded:

- MKS 20705 CN

- MOER 15-050184-00 (5)

- MAT 507 BW

- RPS AX 7670-89

2000 Vintage

Specifications

ManufacturerLAM/ Novellus
ModelConcept Two Dual Altus W-CVD (Chemical Vapor Deposition)
Year2000
ConditionUsed
Stock NumberBM6450