Oxford Plasmalab 800 Plus PECVD (Plasma‑Enhanced Chemical Vapor Deposition) System

Oxford Plasmalab 800 Plus PECVD (Plasma‑Enhanced Chemical Vapor Deposition) System

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Description

Plasmalab 800 Plus PECVD (Plasma‑Enhanced Chemical Vapor Deposition) System


OXFORD Plasmalab 800 Plus is an advanced etcher/asher used for the processing of a variety of materials, especially those with high precision metallization such as thin films. Its superior performance and precision make it an ideal choice for a variety of industrial and research applications. The machine is equipped with a 7 cm wafer capacity, making it suitable for large scale sample processing. It offers a choice of either low-pressure or dual-pressure systems, providing high rates of substrate etching and ashing, with maximum accuracy and high repeatability. The wafer size range is adjustable from 100 - 300 mm, making it capable of processing from micron to macro scale. The machine includes both a high voltage power supply and an iso-power supply, enabling a range of plasma processes and providing the most versatile and consistent results. This makes it capable of performing precision etching and ashing in order to meet demanding requirements. It also offers the options of temperature control up to 500°C, operating pressure up to 3 Torr, and RF power up to 1 kW. Plasmalab 800 Plus is also fitted with automated loading and unloading systems, allowing users to load multiple samples at the same time and easily switch between them. It also offers a wide range of customizable parameters to best suit the specific requirements of the job. The machine also comes with an air-cooling system, making it possible to achieve a safe and uniform etching or ashing process. The machine is suitable for a variety of materials including Al, Ti, and Au, with no degradations in quality or reliability. OXFORD Plasmalab 800 Plus's user-friendly interface easily integrates with a range of external databases and tool pathways, making processing easier and more efficient. This system also comes with a range of diagnostics providing users with valuable insight into the system, leading to increased process safety and reliability. All in all, Plasmalab 800 Plus is an ideal choice for a range of demanding etching and ashing jobs. With its versatile features, robust design, and impressive performance, it is an excellent choice for the professional user.

Specifications

ManufacturerOxford
ModelPlasmalab 800 Plus PECVD (Plasma‑Enhanced Chemical Vapor Deposition) System
ConditionUsed
Stock NumberBM6564