1999 AMAT Centura 5200 MxP+ Dielectric

Dielectric Etch

Etch/Ash/Clean - Plasma Processing

Date of Manufacture: 1999-01-01

Currently Configured for: 200mm

Software: 4.9_15

MF: Centura 5200

Qty 4 - MxP+ Dielectric

ESC: Polymide

Gases Used: N2, C4F8, 02, CH3F, CF4, CHF3, AR, NF3, CO

MFCs: 40 DIgital MFC's Unit , Tylan or Horiba

Robot: HP Robot 

Dry Pumps:

2-BA100, 4-IDP80 / WSU151

Chillers:

2-Neslab 150