2006 Jeol JBX 6300 FS E-Beam Lithography

Jeol JBX 6300 FS E-Beam Lithography, 8"

- Polymer coated wafer

- Pattern: Resist

- Motorized aperture

- Loader push rod loadlock

- (2) Pumps

- SF6 Tank

Emitter:

- White: 120 kV

- High-voltage connecter

- Water cooled blanker

- High brightness field emission electron source

- Acceleration: 100 keV

- 25 MHz Deflection system

- With magnetic lens

- Beam diameter: 2 nm

- Pattern diameter: 8 nm

- Laser controlled stage capable: 1 cm

- Power supply: 208 V.

2006 Vintage