Suss Microtec Labspin 8 resist coater for wafers

SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D.

Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.

LabSpin8 is suitable for round substrates up to 200 mm diameter or square substrates up to 150x150 mm.

With a wide range of substrate holders, even fragments and special shapes can be processed without any problems.

The LabSpin platform is characterized by a compact and space-saving design and requires little clean room space.

The large variety of LabSpin options allows a very wide range of applications.

Coatings can be applied manually with syringes, semi-automatically with cartridges or with up to two fully automatic dispensing systems.

In addition to edge coating, edge bead removal and puddle development, further options are available.

SUSS LABSPIN8 TT Table top system for wafer up to 200 mm round or up to 150 mm square substrates

Consisting of: + Spinner module + Control Unit + Bowl cover made of safety glass + Process bowl made of Polypropylene 

Digital vacuum gauge 

Safety features: + Vacuum monitoring + Cover open interlock 

Integrated into a table top cabinet made of stainless steel 

Technical data: + 115/230 VAC; 60/50 Hz; 5/3 A single phase 

Speed: 50 - 99 rpm, 100 - 8,000 rpm (+/- 1 rpm) with 200 mm chuck 

Acceleration: 4,000 rpm/sec 

Spinning time: 1 s up to 999 s + 200 recipes with 40 steps each + Waste bottle 0.5l 

Exhaust connection PG11 tube

Dimensions (W x D x H): Cabinet: 350 x 446 x 430 (691 cover open) mm³