2003 Nikon NSR-SF200

2003 Nikon NSR-SF200
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Description
- Vintage: 2003
- Condition: Initial Condition
-Configuration
. Manufacture: Nikon Precision
. Model: SF200
. Wafer size: 150mm
. Handedness: Inline left or right
configuration available
. Altitude : Varies by site
. Chamber type: Standard
. Chamber temperature set point:
. Variable numerical aperture: Max 0.63
. sPURE
. Options - Resolution Enhancement Technology (RET)
. RET apertures iNA=
0.50, 0.38, 0.24, 0.19, 0.12, 0.38(Annual)
. Quick Reticle Change (QRC)
. Reticle Size: 6 inches
. Reticle Barcode Reader - Options
. Field Image Alignment system (FIA)
. Laser Step Alignment system (LSA)
. Phase Contrast FIA
. TTLFC2
. Pre-alignment 2
. Wafer stage: Air Bearing/Linear Motors
. Ceramic wafer holder
. wafer loader
. Chip leveling included
. Multipoint Focus/Level
. Extended wafer carrier table - Options
. Pellicle particle detector - Options
. Online
. Nikon SECS II GEM interface
. Gigaphoton KrF Excimer Laser Source
Specifications
| Manufacturer | Nikon |
| Model | NSR-SF200 |
| Year | 2003 |
| Condition | Used |
| Stock Number | BM6796 |






















