2019 Hitachi Dry Etch / Plasma Asher unit

2019

We are offering a 2019 Hitachi High-Technologies Plasma Asher unit, manufactured in Japan and configured for high-current operation (150A, 3Ø AC 208V).

Product Details

Hitachi HS 9050 Asher, 12’’

Multi chamber

Asher / Etch chambers (5)

Cooling chambers (2)

Transfer modules

HDD removed

No software

Copper capable

Mini-Environment Wafer Loading Module (EFEM)

This system is suitable for:

Capacity expansion

Legacy line support

R&D and pilot production

Replacement of ageing etch platforms

Manufactured in 2019, this is a modern, high-performance platform ideal for facilities seeking reliable dry etch capability without extended OEM lead times.

Important Information

Full specifications, configuration details and additional images ere available upon request.