2022 KLA-Tencor Corp. Candela 8520

Wafer Inspection Equipment

Metrology Equipment

Date of Manufacture: 2022-12-01

Currently Configured for: 150mm

Description

1Voltage: 208/230 +10% VAC, 1-phase

2Power Consumption: 1.1kVA

3Power frequency: 50/60Hz

4Maximum power: 2.3kVA

5Wafer Size 6 and 8” Wafer

6Wafer Thickness 350μm ~ 1100μm

7Wafer Carrier 2 FUP 6 and 8

8Wafer Mapping Micro Optical Sensor 

9 SECS-GEM Interfaces

10CDA

Pressure: 100 psi / 689 KPa (± 10% range).

Flow: 2 SCFM / 80 L/min (± 10% range).

AMC: maximum concentration of Volatile Organic Compounds (VOC) must be less than 150 ng/l.

Anions must be less than 14 ng/l. Cations must be less than 10 ng/l. 

Moisture Content: less than 20 PPM at 1.0 atm, corresponding to a dewpoint of -30° Celsius (-22°F).

11Vacuum

Pressure: -680 mm Hg / -90 KPa (± 10% range).

Flow: 0.64 SCFM / 18 L/min (± 10% range).

12The Candela 85XX uses two lasers 405 nm wavelength, 60 mW power (Class IIIb per CDRH 21CFR 1040).

355 nm wavelength, 20 mW power (Class IIIb per CDRH 21CFR 1040).