1999 LAM 4526i Oxide Etch

Date of manufacture: 1999 Refurbished by SoS in 2012 incl dual monitor upgrade

Wafer size 150mm   

Currently Configured for 200mm Wafers

Install Type: Stand-Alone/Ballroom SMIF System

SW: Envision 1.6.1-012

Vintage 1999

ASYST SMIF Send/Receive indexers

Mainframe: TCP9600SE CFE

WVDS

On-Board AC Dist.

On-Board RF Generators:

(3) Onboard AE RFG 1250

SECS Interface

Main Process Module (PM1): TCP 9600SE

Wafer Clamp: ESC w/He Cooling Electrode Gap:Fixed gap

8” TCP Coil

Turbo CNTRL: BOC Edwards 1300

Gate Valve: VAT 65 (heated)

Heated Pump Stack & Manifold

Endpoint Detection: Dual Photo diode

Endpoint Wavelength(s): 703nm and 261.8nm

PM2: DSQ Stripper

Hinged DSQ

Gas Box Config:

Orbitally Welded Gas Box

Backside Helium Cooling

Gas Line 1 2 4 5 6 7 8

Gas Flow (sccm) MFC Mfgr. MFC Model

Cl2 100 Unit 1660

BCL3 100 Unit 1660

CH4 10 Unit 1660

N2 10 Unit 1660

O2 200 Unit 1660

O2 500 Unit 1660

H20 500 Tylan VC-4900VRH

Power Requirements: 208V, 80A, 3-Phase, Freq 50/60Hz

Missing items;

Chamber Manometer 0.1 torr

Watertank WVDS unhooked but with machine