2000 Lam Research 4526i Oxide Etch

Condition: “As is”  

Date of manufacture: 2000

Wafer size 150mm

Tool Model : 4520i

Bulkhead system mount w/tunnel covers

Hine 38A open cassette Send/Receive indexers

Software Version: Classic 7,31-42

Oxide etcher, 6”

Clamp type, ESC

RF power Rack AE PDW2200 RFG1250 13,56MHz

AE Isotropic Module

Chiller Unit (none/To customer Spec )

AC Rack AC Power Distribution

Moving gap

Back Helium Colling

Main Power 208V, 3 Phase, 5Wire, 175A, 60/

Belt driven load station

Standard load station shuttle spatula

Upper chamber gap drive encoder

Dip PCB for RF power tuning

Aluminum upper chamber electrode

Single lower chamber endpoint detector (405/520nm) Non-

-heated endpoint window

Low pressure chamber manifold

HPS valve for chamber isolation

AC--2 chamber pressure control

Lower chamber RGA port

8 -- Gas box Orbital gas box

Gas 1: AR 375sccm

Gas 2: CF4 100 sccm

Gas 3: CHF3 50 sccm

Gas 4: He 200 sccm

Gas 5: O2 20 sccm

Gas 6: N2 200 sccm

Gas 7 NF3 500 sccm

Gas 8: He 1000sccm

UPC: He (50 sccm)

AC input box for AC power inlet

Trip breakers AC/DC power box