2001 Lam Research 4526i Oxide Etch

Condition: “As is” 

Date of manufacture:  2001

​Wafer size 150mm

Bulkhead system mount w/tunnel covers

Hine 38A open cassette Send/Receive indexers

Software Version: Envision

Oxide etcher, 6”

Clamp type ESC

RF power Rack AE PDW2200 RF Generator

AE Isotropic Module

Chiller Unit (none/To customer Spec )

AC Rack AC Power Distribution

Moving gap

Back Helium Colling

Main Power 208V, 3 Phase, 5Wire, 175A, 60/

Hine 38A open cassePe Send/Receive indexers

Belt driven load station

Standard load station shuttle spatula

Upper chamber gap drive encoder

Dip PCB for RF power tuning

Aluminum upper chamber electrode

6" Clamp lower chamber electrode

Single lower chamber endpoint detector (405/520nm) Non-

-heated endpoint window

Low pressure chamber manifold

HPS valve for chamber isolation

AC--2 chamber pressure control

Lower chamber RGA port

8 -- Gas box Orbital gas box

Gas 1: AR 500sccm

Gas 2: CF4 50 sccm

Gas 3: CHF3 50 sccm

Gas 4: CF4 200 sccm

Gas 5: O2 50 sccm

Gas 6: N2 50 sccm

Gas 7 HE 500 sccm

Gas 8: NF3 500sccm

UPC: He (50 sccm)

AC input box for AC power inlet