Cambridge NanoTech Aurora ALD System

SYSTEM OVERVIEW

The Aurora ALD system by Cambridge NanoTech is a precision thin-film deposition platform designed for atomiclayer deposition (ALD) processes. It enables conformal, pinhole-free coatings with angstrom-level thicknesscontrol.

PRIMARY APPLICATIONS• Semiconductor fabrication• Nanotechnology research• Battery and energy coatings• MEMS and sensors• Barrier and dielectric films

KEY COMPONENTSReaction chamber, precursor delivery, vacuum system, thermal control, and computer-based process control.

TYPICAL PERFORMANCEAngstrom-level thickness controlHighly uniform coatingsRepeatable ALD processes

HOW IT WORKSSequential precursor pulsing deposits one atomic layer per cycle, building precise thin films.

INSTALLATION REQUIREMENTSElectrical service, process gases, exhaust/scrubber, compressed air, and controlled environment.

SUMMARYHigh-precision ALD platform for advanced manufacturing and R&D