Temescal BJD1800 Ebeam Evaporator System

TEMESCAL BJD-1800

Electron Beam Evaporation System (E-Beam PVD Platform)

SYSTEM OVERVIEWThe Temescal BJD-1800 is a high-vacuum electron beam physical vapor deposition (PVD) system used forprecision thin-film coating. It utilizes focused electron beam energy to evaporate materials in a controlled vacuumenvironment, enabling high-purity film deposition.

PRIMARY APPLICATIONS• Semiconductor fabrication• Optical and infrared coatings• Aerospace and defense components• Thin-film metallization (Al, Au, Ti, Ni, etc.)• Research and development

KEY COMPONENTSVacuum System:Mechanical pump, booster pump, cryogenic pumpDeposition:Electron beam gun, water-cooled cruciblePower Panel:90A main, dedicated pump and EPS circuitsControls:Heater circuits, 120VAC / 24VAC auxiliary power

TYPICAL PERFORMANCEBase Pressure: ~10^-6 to 10^-8 TorrDeposition Rate: 1–100 A/secHigh film uniformity and material flexibility

HOW IT WORKS1. Chamber is evacuated using staged vacuum pumps2. Electron beam heats source material3. Material evaporates in vacuum4. Vapor deposits onto substrate as a thin film

INSTALLATION REQUIREMENTS• High-current electrical service (~90A)• Chilled water supply• Clean dry compressed air• Facility exhaust and integration• Clean environment preferred

SUMMARYThe BJD-1800 is a robust, industrial-grade thin film deposition platform offering high precision, repeatability, andflexibility across semiconductor and advanced manufacturing applications