2004 AMAT Centura Ultima TE

HDP CVD (Chemical Vapor Deposition)

Deposition Equipment

Date of Manufacture: 2004-01-01

Currently Configured for: 200mm

Centura HDP System

x1 Ultima TE Chamber

x2 DxZ Nitride Chambers

x1 Wafer Orienter Chamber

x1 Multi-Slot Cooldown Chamber