Accretech A-C 300 Standalone Automatic Wafer Cleaning Unit

· Main body

· Twin arm setup (1x cleaning, 1x drying)

· Programmable cleaning recipe setups

· Spinning table speed 30..3000rpm

· High pressure cleaning 3..10MPa

· Air or Nitrogen drying, pressure 0.5..0.7MPa

· 8" cleaning table

· 12" cleaning table

· High pressure cleaning or Bubble Cleaner Function

· Universal transformer (for 200 to 480V power supply)

Never been used