2008 ASML XT1900Gi and 2015 TEL LITHIUS PRO-I

ASML Config:

Tool Status Running Wafers

Wafer Size 300 mm

Fab Section Lithography

Vintage 2008

Asset Description 193nm Immersion scanner

Software Version 5.1

CIM secs

Process 40/45nm

Handler System wfr handler

Factory Interface FOUP 1

Main System main body 1

TEL Config:

Tool Status Running Wafers

Wafer Size 300 mm

Fab Section Lithography

Vintage 2015

Asset Description LATK765-T (DISCRETE BUY) (EX-

SLB1-LATK765-S/N MDN150752)

Software Version 1.00.81

CIM SECS

Process ARF IMMERSION

Hardware Configuration

Main System DEV 6

Main System CPRP 6

Main System CSWP 6

Handler System PRAI 1

Handler System Foup Exchanger 1

Handler System PRA 4

Handler System IRAI 1

Handler System MPRA 1

Main System CGRA 11

Main System Main Tool 1

Main System COT 3

Handler System CRA 1

Factory Interface FOUP 4

Main System BCT 3

Main System ITC 3