CEE Apogee 200 Benchtop Spin Coater

CEE Apogee 200 Benchtop Spin Coater

Tabletop photoresist spin coater for use with wafers up to 200mm.

Eliminate process variability from your critical experiments with the Cee® Apogee® Spin Coater. This compact system delivers track-quality performance with its durable, chemically compatible design and fully programmable, user-friendly operation.

Full-color touchscreen graphical user interface (GUI).

 Supports unlimited user-defined program steps for each recipe.

0.1  second step time resolution (9,999.9 seconds maximum step time)

Spin speeds up to 12,000rpm.

 Spin speed acceleration up to 30,000rpm/s unloaded.

Multiple simultaneous automated dispense capability.

 In-process dynamic speed & acceleration control

Substrate sizes: 200mm round; 6" x 6" square (max)

Acceleration 0 to 13000 rpm/s with a 200mm substrate

110V,50/60Hz, 6A

SYSTEM HAS PHOTORESIST STAINS FROM PREVIOUS OWNER.